Wet and Dry Etching Process and Technology

Date: 11 & 12 December 2017 (Monday & Tuesday)


Time: 9am - 5pm


Venue: Kompleks ЄUREKA, Universiti Sains Malaysia, Penang.


 


Synopsys


Etching is a process of material removal. It has vast application in semiconductor industry. Depending on what is the requirement, etching can be performed with various techniques. Factors determining which techniques to be used will be explained in this training. Differences between wet and dry etching will be highlighted. Requirements of these etching will be elaborated. Chemistry related to both techniques will be explained and their general mechanism will be presented in this training. Issues and challenges of those techniques will be mentioned and solutions will be recommended.


 


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